STRUCTURE OF TIN COATINGS DEPOSITED AT RELATIVELY HIGH-RATES AND LOW-TEMPERATURES BY MAGNETRON SPUTTERING

被引：72

作者：

VALVODA, V ^{[1
]}

KUZEL, R ^{[1
]}

CERNY, R ^{[1
]}

MUSIL, J ^{[1
]}

机构：

[1] CZECHOSLOVAK ACAD SCI, INST PHYS, CS-18040 PRAGUE 8, CZECHOSLOVAKIA

来源：

THIN SOLID FILMS | 1988年 / 156卷 / 01期

关键词：

D O I：

10.1016/0040-6090(88)90282-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：53 / 63

页数：11

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