TI-N PHASES FORMED BY REACTIVE ION PLATING

被引：100

作者：

MOLARIUS, JM ^{[1
]}

KORHONEN, AS ^{[1
]}

RISTOLAINEN, EO ^{[1
]}

机构：

[1] HELSINKI UNIV TECHNOL,DEPT MIN & MET,PHYS MET LAB,SF-02150 ESPOO 15,FINLAND

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1985年 / 3卷 / 06期

关键词：

D O I：

10.1116/1.572850

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：2419 / 2425

页数：7

共 30 条

[1] RANGES OF SOME LIGHT-IONS MEASURED BY (P, GAMMA) RESONANCE BROADENING
ANTTILA, A
BISTER, M
FONTELL, A
WINTERBON, KB
[J]. RADIATION EFFECTS AND DEFECTS IN SOLIDS, 1977, 33 (01): : 13 - 19
[2] ARBUZOV MP, 1977, IZV AKAD NAUK SSSR N, V13, P1799
[3] CHEVALLIER J, 1981, MICROHARDNESS TIN CO
[4] Ehrlich P., 1949, Z ANORG CHEM, V259, P1, DOI [10.1002/zaac.19492590102, DOI 10.1002/ZAAC.19492590102]
[5] HATSCHEK RL, 1983, AM MACH, V127, P129
[6] THE MICROSTRUCTURE OF REACTIVELY SPUTTERED TI-N FILMS
HIBBS, MK
SUNDGREN, JE
JACOBSON, BE
JOHANSSON, BO
[J]. THIN SOLID FILMS, 1983, 107 (02) : 149 - 157
[7] STRUCTURAL STUDIES ON TITANIUM-NITROGEN SYSTEM
HOLMBERG, B
[J]. ACTA CHEMICA SCANDINAVICA, 1962, 16 (05): : 1255 - &
[8] STRUCTURE AND ELECTRICAL-PROPERTIES OF TITANIUM NITRIDE FILMS
IGASAKI, Y
MITSUHASHI, H
AZUMA, K
MUTO, T
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1978, 17 (01) : 85 - 96
[9] MICROSTRUCTURES OF TIN AND TI2N DEPOSITS PREPARED BY ACTIVATED REACTIVE EVAPORATION
JACOBSON, BE
NIMMAGADDA, R
BUNSHAH, RF
[J]. THIN SOLID FILMS, 1979, 63 (02) : 333 - 339
[10] KANKAANPAA H, 1985, UNPUB