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CHEMICAL VAPOR-DEPOSITION OF HEXAGONAL BORON-NITRIDE THICK-FILM ON IRON
被引:91
作者
:
TAKAHASHI, T
论文数:
0
引用数:
0
h-index:
0
机构:
Department of Applied Chemistry, Faculty of Engineering, Nagoya University, Nagoya
TAKAHASHI, T
ITOH, H
论文数:
0
引用数:
0
h-index:
0
机构:
Department of Applied Chemistry, Faculty of Engineering, Nagoya University, Nagoya
ITOH, H
TAKEUCHI, A
论文数:
0
引用数:
0
h-index:
0
机构:
Department of Applied Chemistry, Faculty of Engineering, Nagoya University, Nagoya
TAKEUCHI, A
机构
:
[1]
Department of Applied Chemistry, Faculty of Engineering, Nagoya University, Nagoya
来源
:
JOURNAL OF CRYSTAL GROWTH
|
1979年
/ 47卷
/ 02期
关键词
:
D O I
:
10.1016/0022-0248(79)90248-3
中图分类号
:
O7 [晶体学];
学科分类号
:
0702 ;
070205 ;
0703 ;
080501 ;
摘要
:
A crystalline and semicrystalline hexagonal BN thick film was obtained on carbon steel (0.3% C) substrate by CVD from the reactant system, BCl3-NH3-H2-Ar. A translucent and crystalline BN film of about 100 μm thick was formed for the reaction time of 90 min in the temperature range of 1100 to 1200°C, while an opaque and semicrystalline BN film was grown at temperatures below 1100°C. The moderate feed gas flow rates were as follows: BCl3 : 0.1 - 0.2 ml/sec; NH3 : 0.8 - 1.2 ml/sec; H2 : 0.5 - 1.0 ml/sec; Ar: 0.5 ml/sec. The deposited film has a conical structure with some large nodular deposits, which suggests that the formation of the first BN layer is initiated by a catalytic action of iron. © 1979.
引用
收藏
页码:245 / 250
页数:6
相关论文
共 7 条
[1]
BERRY L, 1971, INORGANIC INDEX POWD
[2]
CLERC G, 1975, CHEM VAPOR DEPOSITIO, P777
[3]
GEBHARDT JJ, 1973, CHEM VAPOR DEPOSITIO, P460
[4]
STRUCTURE AND PROPERTIES OF BORON-NITRIDE FILMS GROWN BY HIGH-TEMPERATURE REACTIVE PLASMA DEPOSITION
HYDER, SB
论文数:
0
引用数:
0
h-index:
0
机构:
VARIAN ASSOC,CORP SOLID STATE LAB,PALO ALTO,CA 94303
VARIAN ASSOC,CORP SOLID STATE LAB,PALO ALTO,CA 94303
HYDER, SB
YEP, TO
论文数:
0
引用数:
0
h-index:
0
机构:
VARIAN ASSOC,CORP SOLID STATE LAB,PALO ALTO,CA 94303
VARIAN ASSOC,CORP SOLID STATE LAB,PALO ALTO,CA 94303
YEP, TO
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1976,
123
(11)
: 1721
-
1724
[5]
BORON-NITRIDE COMPOSITES BY CHEMICAL VAPOR-DEPOSITION
PIERSON, HO
论文数:
0
引用数:
0
h-index:
0
机构:
SANDIA LABS,ALBUQUERQUE,NM 87115
SANDIA LABS,ALBUQUERQUE,NM 87115
PIERSON, HO
[J].
JOURNAL OF COMPOSITE MATERIALS,
1975,
9
(JUL)
: 228
-
240
[6]
POWELL CF, 1962, VAPOUR DEPOSITION, P663
[7]
PREPARATION AND PROPERTIES OF THIN FILM BORON NITRIDE
RAND, MJ
论文数:
0
引用数:
0
h-index:
0
RAND, MJ
ROBERTS, JF
论文数:
0
引用数:
0
h-index:
0
ROBERTS, JF
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1968,
115
(04)
: 423
-
&
←
1
→
共 7 条
[1]
BERRY L, 1971, INORGANIC INDEX POWD
[2]
CLERC G, 1975, CHEM VAPOR DEPOSITIO, P777
[3]
GEBHARDT JJ, 1973, CHEM VAPOR DEPOSITIO, P460
[4]
STRUCTURE AND PROPERTIES OF BORON-NITRIDE FILMS GROWN BY HIGH-TEMPERATURE REACTIVE PLASMA DEPOSITION
HYDER, SB
论文数:
0
引用数:
0
h-index:
0
机构:
VARIAN ASSOC,CORP SOLID STATE LAB,PALO ALTO,CA 94303
VARIAN ASSOC,CORP SOLID STATE LAB,PALO ALTO,CA 94303
HYDER, SB
YEP, TO
论文数:
0
引用数:
0
h-index:
0
机构:
VARIAN ASSOC,CORP SOLID STATE LAB,PALO ALTO,CA 94303
VARIAN ASSOC,CORP SOLID STATE LAB,PALO ALTO,CA 94303
YEP, TO
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1976,
123
(11)
: 1721
-
1724
[5]
BORON-NITRIDE COMPOSITES BY CHEMICAL VAPOR-DEPOSITION
PIERSON, HO
论文数:
0
引用数:
0
h-index:
0
机构:
SANDIA LABS,ALBUQUERQUE,NM 87115
SANDIA LABS,ALBUQUERQUE,NM 87115
PIERSON, HO
[J].
JOURNAL OF COMPOSITE MATERIALS,
1975,
9
(JUL)
: 228
-
240
[6]
POWELL CF, 1962, VAPOUR DEPOSITION, P663
[7]
PREPARATION AND PROPERTIES OF THIN FILM BORON NITRIDE
RAND, MJ
论文数:
0
引用数:
0
h-index:
0
RAND, MJ
ROBERTS, JF
论文数:
0
引用数:
0
h-index:
0
ROBERTS, JF
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1968,
115
(04)
: 423
-
&
←
1
→