CHEMICAL VAPOR-DEPOSITION OF HEXAGONAL BORON-NITRIDE THICK-FILM ON IRON

被引:91
作者
TAKAHASHI, T
ITOH, H
TAKEUCHI, A
机构
[1] Department of Applied Chemistry, Faculty of Engineering, Nagoya University, Nagoya
关键词
D O I
10.1016/0022-0248(79)90248-3
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
A crystalline and semicrystalline hexagonal BN thick film was obtained on carbon steel (0.3% C) substrate by CVD from the reactant system, BCl3-NH3-H2-Ar. A translucent and crystalline BN film of about 100 μm thick was formed for the reaction time of 90 min in the temperature range of 1100 to 1200°C, while an opaque and semicrystalline BN film was grown at temperatures below 1100°C. The moderate feed gas flow rates were as follows: BCl3 : 0.1 - 0.2 ml/sec; NH3 : 0.8 - 1.2 ml/sec; H2 : 0.5 - 1.0 ml/sec; Ar: 0.5 ml/sec. The deposited film has a conical structure with some large nodular deposits, which suggests that the formation of the first BN layer is initiated by a catalytic action of iron. © 1979.
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页码:245 / 250
页数:6
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