INFLUENCE OF DEBYE LENGTH ON C-V MEASUREMENTS OF DOPING PROFILES

被引：236

作者：

JOHNSON, WC

PANOUSIS, PT

机构：

来源：

IEEE TRANSACTIONS ON ELECTRON DEVICES | 1971年 / ED18卷 / 10期

关键词：

D O I：

10.1109/T-ED.1971.17311

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

收藏

页码：965 / &

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