Enhanced dissociation of molecular nitrogen in a microwave plasma with an applied magnetic field

被引：10

作者：

Geddes, J. ^{[1
]}

McCullough, R. W. ^{[1
]}

Higgins, D. P. ^{[1
]}

Woolsey, J. M. ^{[2
]}

Gilbody, H. B. ^{[1
]}

机构：

[1] Queens Univ Belfast, Dept Pure & Appl Phys, Belfast BT7 1NN, Antrim, North Ireland

[2] Univ Stirling, DBMS Phys, Stirling FK9 4LA, Scotland

来源：

PLASMA SOURCES SCIENCE & TECHNOLOGY | 1994年 / 3卷 / 01期

关键词：

D O I：

10.1088/0963-0252/3/1/007

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

The dissociation of nitrogen in a 2.45 GHz microwave plasma has been significantly enhanced by the application of a magnetic field perpendicular to the oscillating electric field. The degree of dissociation measured in the emergent beam was found to be strongly dependent on the magnetic field strength, nitrogen pressure and microwave power. These results have been interpreted in terms of microwave absorption resonances. Dissociation fractions up to 0.67 have been measured.

引用

页码：58 / 60

页数：3

共 9 条

[1]

[Anonymous], 1984, INTRO PLASMA PHYS CO

[2] ACTIVE NITROGEN-ATOMS IN AN ATMOSPHERIC-PRESSURE FLOWING AR-N2 MICROWAVE-DISCHARGE [J].

CALLEDE, G ;

DESCHAMPS, J ;

GODART, JL ;

RICARD, A .

JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1991, 24 (06) :909-914

[3] PRODUCTION OF QUIESCENT DISCHARGE WITH HIGH ELECTRON TEMPERATURES [J].

LISITANO, G ;

ELLIS, RA ;

HOOKE, WM ;

STIX, TH .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1968, 39 (03) :295-&

[4] A NEW MICROWAVE-DISCHARGE SOURCE FOR REACTIVE ATOM BEAMS [J].

MCCULLOUGH, RW ;

GEDDES, J ;

DONNELLY, A ;

LIEHR, M ;

HUGHES, MP ;

GILBODY, HB .

MEASUREMENT SCIENCE AND TECHNOLOGY, 1993, 4 (01) :79-82

[5] MEASUREMENTS OF THE ATOMIC NITROGEN POPULATION PRODUCED BY A MICROWAVE ELECTRON-CYCLOTRON RESONANCE PLASMA [J].

MEIKLE, S ;

HATANAKA, Y .

APPLIED PHYSICS LETTERS, 1989, 54 (17) :1648-1649

[6] 2.45 GHZ microwave plasmas at magnetic fields below ECR [J].

Popov, Oleg A. ;

Shapoval, Sergei Y. ;

Yoder, Merle D., Jr. .

PLASMA SOURCES SCIENCE & TECHNOLOGY, 1992, 1 (01) :7-12

[7] ELECTRON-CYCLOTRON RESONANCE PLASMA CHEMICAL VAPOR-DEPOSITION OF LARGE AREA UNIFORM SILICON-NITRIDE FILMS [J].

SHAPOVAL, SY ;

PETRASHOV, VT ;

POPOV, OA ;

YODER, MD ;

MACIEL, PD ;

LOK, CKC .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1991, 9 (06) :3071-3077

[8] FACTORS DETERMINING DISSOCIATION FRACTIONS IN ATOMIC-BEAMS GENERATED BY STRAIGHT-THROUGH MICROWAVE-DISCHARGE SOURCES [J].

SPENCE, D ;

STEINGRABER, OJ .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1988, 59 (11) :2464-2467

[9]

Stix T., 1962, THEORY PLASMA WAVES

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