IMPROVEMENT IN MAGNETORESISTANCE OF VERY THIN PERMALLOY-FILMS BY POSTANNEALING

被引：19

作者：

FUNAKI, H

OKAMOTO, S

KITAKAMI, O

SHIMADA, Y

机构：

[1] Research Institute for Scientific Measurements, Tohoku University, Aoba-ku, Sendai, 980

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1994年 / 33卷 / 9B期

关键词：

SPUTTER-BEAM METHOD; PERMALLOY; MAGNETORESISTANCE; COERCIVITY; ANISOTROPY FIELD;

D O I：

10.1143/JJAP.33.L1304

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We prepared Ni80Fe20 films by the sputter-beam method and investigated their magnetotransport properties. The very thin film of 200 Angstrom exhibited a high magnetoresistance of 3.5% after an appropriate post-annealing treatment. The improvement is due to the decrease of zero-field resistivity resulting from remarkable grain growth in the films. Taking into account diffusive electron scattering at the film surface, the magnetoresistance value is thought to be very close to that of the bulk.

引用

页码：L1304 / L1306

页数：3

共 12 条

[1] The conductivity of thin metallic films according to the electron theory of metals [J].