KINETIC ROUGHENING IN MOLECULAR-BEAM EPITAXY

被引：106

作者：

TANG, LH

NATTERMANN, T

机构：

[1] 4630 Bochum

来源：

PHYSICAL REVIEW LETTERS | 1991年 / 66卷 / 22期

关键词：

D O I：

10.1103/PhysRevLett.66.2899

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

We extend a continuum model recently proposed by Villain [J. Phys. I (France) 1, 19 (1991)] to study equilibrium and nonequilibrium diffusion on a high-symmetry surface under a fluctuating particle beam. Exponents characterizing dynamic scaling in various regimes are derived explicitly in all dimensions, as well as the relevant lengths which separate these regimes. Different surface morphologies are correlated with experimentally accessible parameters such as substrate temperature and deposition rate.

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页码：2899 / 2902

页数：4

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