PHOTOREACTION MECHANISM FOR AMORPHOUS PEROXOPOLYTUNGSTIC ACID AS AN INORGANIC PHOTORESIST MATERIAL

被引：11

作者：

OKAMOTO, H ^{[1
]}

ISHIKAWA, A ^{[1
]}

KUDO, T ^{[1
]}

机构：

[1] HITACHI LTD,CENT RES LAB,KOKUBUNJI,TOKYO 185,JAPAN

来源：

关键词：

D O I：

10.1016/1010-6030(89)87135-7

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：377 / 385

页数：9

共 15 条

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