X-RAY DIFFRACTION MICROSCOPY STUDY OF IMPERFECTIONS IN SILICON SINGLE CRYSTALS

被引：28

作者：

SCHWUTTKE, GH

机构：

来源：

关键词：

D O I：

10.1149/1.2425320

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：27 / 32

页数：6

共 17 条

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