KINETICS AND MECHANISM OF PLATINUM SILICIDE FORMATION ON SILICON

被引：160

作者：

POATE, JM ^{[1
]}

TISONE, TC ^{[1
]}

机构：

[1] BELL TEL LABS INC,MURRAY HILL,NJ 07974

来源：

APPLIED PHYSICS LETTERS | 1974年 / 24卷 / 08期

关键词：

D O I：

10.1063/1.1655230

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：391 / 393

页数：3

共 15 条

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