PRODUCTION AND PROPERTIES OF VACUUM EVAPORATED FILMS OF THORIUM FLUORIDE

被引：16

作者：

HEITMANN, W

RITTER, E

机构：

[1] Forschungsinstitut des Fernmeldetechnischen Zentralamtes der Deutschen Bundespost

[2] Balzers Aktiengesellschaft für Hochvakuumtechnik und Düne Schichten

来源：

APPLIED OPTICS | 1968年 / 7卷 / 02期

关键词：

D O I：

10.1364/AO.7.000307

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Experiments for the production of vacuum evaporated films of thorium oxyfluoride showed that these films cannot be produced by direct evaporation of thorium oxyfluoride, because this material decomposes at approximately 10000C into ThF4 and ThO2. ThF4 evaporates at approximately 9000C and yields very stable films. The production of ThF4 films is described and the dispersion of the refractive index, the dielectric constant, and the useful range of high transparency are reported. Precautions for the handling of ThF4, because of its radioactivity, are given. © 1968 Optical Society of America.

引用

页码：307 / &

共 11 条

[1] BEHRNDT KH, 1966, J VAC SCI T, V5, P264
[2] FURTHER REMARKS ON THE HYDRATES OF THORIUM TETRAFLUORIDE
DEYE, RWM
BOOTH, GW
[J]. JOURNAL OF INORGANIC & NUCLEAR CHEMISTRY, 1957, 4 (01): : 13 - &
[3] DIMMICK GL, 1946, Patent No. 2397929
[4] STRESSES DEVELOPED IN OPTICAL FILM COATINGS
ENNOS, AE
[J]. APPLIED OPTICS, 1966, 5 (01): : 51 - &
[5] HASS G, 1964, PHYSICS THIN FILM ED, V2, P231
[6] HEAVENS OS, 1964, PHYSICS THIN FILMS, V2, P231
[7] Heisen A., 1961, OPTIK, V18, P59
[8] HEITMANN W, 1966, Z ANGEW PHYSIK, V21, P503
[9] HEITMANN W, 1967, Z ANGEW PHYSIK, V23, P221
[10] DER EINFLUSS DER DISPERSION AUF DIE OPTISCHE SCHICHTDICKENBESTIMMUNG
KOPPELMANN, G
KREBS, K
[J]. ZEITSCHRIFT FUR PHYSIK, 1956, 145 (04): : 486 - 495

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