STRESSES DEVELOPED IN OPTICAL FILM COATINGS

[1] *LA DETERMINATION DE LINDICE ET DE LEPAISSEUR DES COUCHES MINCES TRANSPARENTES [J]. JOURNAL DE PHYSIQUE ET LE RADIUM, 1950, 11 (07): : 310 - 314

[2] BLACKBURN H, 1961, 8 P NATL VAC S, V2, P947

[3] CALCULATION OF STRESS IN ELECTRODEPOSITS FROM THE CURVATURE OF A PLATED STRIP [J]. JOURNAL OF RESEARCH OF THE NATIONAL BUREAU OF STANDARDS, 1949, 42 (02): : 105 - 123

[4] Campbell D. S., 1963, ELECTRON RELIABILITY, V2, P207

[5] MURBACH HP, 1953, P PHYS SOC, VB 66, P905

[6] EFFECT OF ATMOSPHERIC EXPOSURE ON STRESS IN EVAPORATED SILICON MONOXIDE FILMS [J]. BRITISH JOURNAL OF APPLIED PHYSICS, 1962, 13 (11): : 561 - &

[7] STRESSES IN EVAPORATED SILICON MONOXIDE FILMS [J]. VACUUM, 1964, 14 (10) : 385 - &

[8] TURNER HF, 1951, TECH REPTS THICK THI

[1] *LA DETERMINATION DE LINDICE ET DE LEPAISSEUR DES COUCHES MINCES TRANSPARENTES [J]. JOURNAL DE PHYSIQUE ET LE RADIUM, 1950, 11 (07): : 310 - 314

[2] BLACKBURN H, 1961, 8 P NATL VAC S, V2, P947

[3] CALCULATION OF STRESS IN ELECTRODEPOSITS FROM THE CURVATURE OF A PLATED STRIP [J]. JOURNAL OF RESEARCH OF THE NATIONAL BUREAU OF STANDARDS, 1949, 42 (02): : 105 - 123

[4] Campbell D. S., 1963, ELECTRON RELIABILITY, V2, P207

[5] MURBACH HP, 1953, P PHYS SOC, VB 66, P905

[6] EFFECT OF ATMOSPHERIC EXPOSURE ON STRESS IN EVAPORATED SILICON MONOXIDE FILMS [J]. BRITISH JOURNAL OF APPLIED PHYSICS, 1962, 13 (11): : 561 - &

[7] STRESSES IN EVAPORATED SILICON MONOXIDE FILMS [J]. VACUUM, 1964, 14 (10) : 385 - &

[8] TURNER HF, 1951, TECH REPTS THICK THI