EFFECT OF ATMOSPHERIC EXPOSURE ON STRESS IN EVAPORATED SILICON MONOXIDE FILMS

被引：26

作者：

NOVICE, MA

机构：

来源：

BRITISH JOURNAL OF APPLIED PHYSICS | 1962年 / 13卷 / 11期

关键词：

D O I：

10.1088/0508-3443/13/11/311

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：561 / &

共 6 条

BRENNER, A ;

SENDEROFF, S .

JOURNAL OF RESEARCH OF THE NATIONAL BUREAU OF STANDARDS, 1949, 42 (02) :105-123

[2] ANNEALING SILICON MONOXIDE FILMS ON ALUMINIUM MIRRORS [J].

HOLLAND, L ;

PUTNER, T ;

BALL, R .

BRITISH JOURNAL OF APPLIED PHYSICS, 1960, 11 (04) :167-168

[3]

PRIEST J, 1961, BRIT J APPL PHYS, V12, P580

[4] APPARATUS FOR MEASUREMENT OF STRESS IN VACUUM EVAPORATED FILMS [J].

PRIEST, JR .

[5]

PRIEST JR, 1961, IN PRESS

[6]

SIDDALL G, 1960, VACUUM, V9, P274