INVESTIGATIONS ON CORRELATION OF PLASMA RESONANCE RADIATION AND SURFACE ROUGHNESS ON THIN SILVER FILMS

被引:12
作者
SCHRODER, E
机构
来源
ZEITSCHRIFT FUR PHYSIK | 1969年 / 225卷 / 01期
关键词
D O I
10.1007/BF01392552
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Investigations are made on the correlation of plasma resonance radiation of thin silver films with their surface roughness. The roughness dimensions are determined by comparing the radiation with theory and furthermore by means of electron microscope. It is found, that the height and the extension of the roughness hills increases with film thickness and with substrate temperature. The values are varied in the range from 20 to 200 å (height of the roughness hills) and from 400 to 1000 å (extension of the roughness hills). Different roughnesses are reached by varying the film thickness and the substrate temperature and in some cases by a special technique of evaporation. © 1969 Springer-Verlag.
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页码:26 / &
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