BORON-NITRIDE THIN-FILMS BY MICROWAVE ECR PLASMA CHEMICAL-VAPOR-DEPOSITION

被引：15

作者：

PAISLEY, MJ ^{[1
]}

BOURGET, LP ^{[1
]}

DAVIS, RF ^{[1
]}

机构：

[1] APPL SCI & TECHNOL ASTEX INC,WOBURN,MA 01801

来源：

THIN SOLID FILMS | 1993年 / 235卷 / 1-2期

关键词：

D O I：

10.1016/0040-6090(93)90238-K

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The objective of this study was the deposition of BN on Si (100) and (111) using microwave electron cyclotron resonance plasma chemical vapor deposition with borazine as the source material. Films were deposited and analyzed employing the techniques of ellipsometry, X-ray photoelectron spectroscopy, X-ray diffraction, transmission electron microscopy and Fourier transform infrared spectroscopy. Results indicated that the deposited films were composed of microcrystals of c-BN and oriented hexagonal BN as well as amorphous BN.

引用

页码：30 / 34

页数：5

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