POSITIVELY CHARGED SURFACE-POTENTIAL OF POLYMER-FILMS AFTER EXCIMER LASER ABLATION - APPLICATION TO SELECTIVE-AREA ELECTROLESS PLATING ON THE ABLATED FILMS

被引：41

作者：

NIINO, H

YABE, A

机构：

[1] National Chemical Laboratory for Industry, Higashi

来源：

APPLIED PHYSICS LETTERS | 1992年 / 60卷 / 21期

关键词：

D O I：

10.1063/1.106877

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Pulsed laser ablation of poly(ethylene trephthalate), polyimide, and polyethersulfone films has been investigated by surface potential analysis on the ablated films. After irradiation with XeCl or KrF excimer laser in air, the surface potential of these films changed to a positive potential mainly due to the redeposition of cationic fragments onto the ablated area. On the basis of the potential analysis, the electroless plating (chemical plating) of copper or nickel was carried out selectively on the ablated surface of these films, through a surface activation process using a negatively charged colloid.

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页码：2697 / 2699

页数：3

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