SCANNING NEAR-FIELD OPTICAL LITHOGRAPHY

被引：65

作者：

WEGSCHEIDER, S ^{[1
]}

KIRSCH, A ^{[1
]}

MLYNEK, J ^{[1
]}

KRAUSCH, G ^{[1
]}

机构：

[1] UNIV KONSTANZ,FAK PHYS,D-78434 CONSTANCE,GERMANY

来源：

THIN SOLID FILMS | 1995年 / 264卷 / 02期

关键词：

LITHOGRAPHY; MICROSCOPY; NANOSTRUCTURES; NEAR FIELD;

D O I：

10.1016/0040-6090(95)05818-4

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We discuss the influence of lateral fiber vibrations on the lateral resolution in scanning near field optical lithography using a tapered optical fiber. The fiber tip acts as a sub-wavelength sized light source to perform high-resolution photolithography in a commercial linear photoresist. After exposure and development, the structures are investigated by atomic force microscopy and a mechanical replica of the optical near held is revealed. We were able to create structures with lateral dimensions below lambda/5. The aspect ratio and the overall shape of the lines are found to depend on the lateral vibrations of the fiber tip needed to perform the shear-force distance measurement.

引用

页码：264 / 267

页数：4

共 15 条

[1]

Abbe E, 1873, ARCH MIKROSK ANAT, V9, P413, DOI [DOI 10.1007/BF02956173, 10.1007/BF02956173]

[2] NEAR-FIELD OPTICS - MICROSCOPY, SPECTROSCOPY, AND SURFACE MODIFICATION BEYOND THE DIFFRACTION LIMIT [J].