FABRICATION OF ALL-HIGH-TC JOSEPHSON JUNCTION USING AS-GROWN YBA2CU3OX THIN-FILMS

被引:7
作者
HARADA, K [1 ]
MYOREN, H [1 ]
OSAKA, Y [1 ]
机构
[1] HIROSHIMA UNIV, FAC ENGN, DEPT ELECT ENGN, HIROSHIMA 724, JAPAN
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1991年 / 30卷 / 8A期
关键词
YBA2CU3OX THIN FILMS; DEPOSITED ON MGO(100); ALL-HIGH-TC JOSEPHSON JUNCTION; PLASMA TREATMENT; AC-JOSEPHSON EFFECT;
D O I
10.1143/JJAP.30.L1387
中图分类号
O59 [应用物理学];
学科分类号
摘要
All-high-T(c) Josephson junctions consisting of a YBCO / barrier / YBCO-layered structure using epitaxial YBCO films sputtered on MgO(100) have been successfully fabricated. The barrier layer was obtained by Ar + O2 plasma treatment of the surface of the base electrodes. These junctions show superconductor / normal-metal / superconductor (SNS)-like current-voltage characteristics. Constant-voltage current steps observed in response to 10 GHz microwave radiation show that ac-Josephson effects occur in these junctions.
引用
收藏
页码:L1387 / L1389
页数:3
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