VOID FORMATION AND GROWTH DURING ELECTROMIGRATION IN THIN FILMS

被引：136

作者：

ROSENBER.R

OHRING, M

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1971年 / 42卷 / 13期

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D O I：

10.1063/1.1659998

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：5671 / &

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