HIGHLY RELIABLE OSCILLATING MIRROR SYSTEM FOR SYNCHROTRON RADIATION LITHOGRAPHY

被引：5

作者：

KURODA, H ^{[1
]}

FUJII, K ^{[1
]}

SUZUKI, K ^{[1
]}

机构：

[1] NEC CORP LTD,FUNDAMENTAL RES LABS,TSUKUBA 305,JAPAN

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1991年 / 9卷 / 06期

关键词：

D O I：

10.1116/1.585290

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

An oscillating mirror system suitable for a synchrotron radiation (SR) beamline has been developed. The system, enclosed in an ultrahigh vacuum chamber, can be used for SR lithography in subquarter micron device process due to its high reliability and high performance. Preliminary tests indicated that deviation in the driving velocity was +/- 3% at maximum, when a 2 cps sine wave command signal was applied. Also, vertical dose uniformity within +/- 3.3% was obtained, when resists were exposed by adequately modified scanning speed.

引用

页码：3218 / 3221

页数：4

共 3 条

[1]

BETZ H, 1984, P SOC PHOTO-OPT INST, V448, P83, DOI 10.1117/12.939210

[2] PRECISELY CONTROLLED OSCILLATING MIRROR SYSTEM FOR HIGHLY UNIFORM EXPOSURE IN SYNCHROTRON RADIATION LITHOGRAPHY [J].

FUJII, K ;

OKADA, K ;

NAGANO, M ;

KURODA, H .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (06) :2128-2131

[3] DESIGN AND PERFORMANCE OF AN X-RAY-LITHOGRAPHY BEAM LINE AT A STORAGE RING [J].

HAELBICH, RP ;

SILVERMAN, JP ;

GROBMAN, WD ;

MALDONADO, JR ;

WARLAUMONT, JM .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04) :1262-1266

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