DESIGN AND PERFORMANCE OF AN X-RAY-LITHOGRAPHY BEAM LINE AT A STORAGE RING

被引：24

作者：

HAELBICH, RP

SILVERMAN, JP

GROBMAN, WD

MALDONADO, JR

WARLAUMONT, JM

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1983年 / 1卷 / 04期

关键词：

D O I：

10.1116/1.582765

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1262 / 1266

页数：5

共 12 条

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[3] GROBMAN WD, 1983, IBM TECHNICAL DISCLO, V25, P6392
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[8] CONVENTIONAL NOVOLAK RESISTS FOR STORAGE RING X-RAY-LITHOGRAPHY
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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04): : 1072 - 1075
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