CONVENTIONAL NOVOLAK RESISTS FOR STORAGE RING X-RAY-LITHOGRAPHY

被引：4

作者：

LANE, JG ^{[1
]}

MALDONADO, JR ^{[1
]}

CLELAND, AN ^{[1
]}

HAELBICH, RP ^{[1
]}

SILVERMAN, JP ^{[1
]}

WARLAUMONT, JM ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1983年 / 1卷 / 04期

关键词：

D O I：

10.1116/1.582679

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1072 / 1075

页数：4

共 6 条

[1] ACOSTA RE, 1983, 1983 INT S EL ION PH
[2] X-RAY-LITHOGRAPHY BY SYNCHROTRON RADIATION OF THE SOR-RING STORAGE RING
ARITOME, H
MATSUI, S
MORIWAKI, K
NAMBA, S
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1939 - 1941
[3] KIMURA T, 1983, 2 P SPIE EL BEAM XRA, V393, P2
[4] DOSIMETRY FOR LITHOGRAPHIC APPLICATIONS
SHAW, JM
HATZAKIS, M
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 1343 - 1347
[5] SILVERMAN JP, 1983, 2 P SPIE EL BEAM XRA, V393, P99
[6] STATIONARY ANODE X-RAY SOURCE FOR THE EVALUATION OF CONVENTIONAL RESISTS
WARLAUMONT, JM
MALDONADO, JR
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 1200 - 1203