LASER PHOTODISSOCIATION OF CHLORINE AND METHYL-CHLORIDE ON LOW-TEMPERATURE SILICON SUBSTRATES

被引：19

作者：

KAWASAKI, M

SATO, H

NISHI, N

机构：

[1] MIE UNIV,CHEM DEPT RESOURCES,TSU,MIE 514,JAPAN

[2] INST MOLEC SCI,OKAZAKI,AICHI 444,JAPAN

来源：

JOURNAL OF APPLIED PHYSICS | 1989年 / 65卷 / 02期

关键词：

D O I：

10.1063/1.343404

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：792 / 798

页数：7

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