MULTIPLE PHOTON EXCITED SF6 INTERACTION WITH SILICON SURFACES

被引：100

作者：

CHUANG, TJ

机构：

来源：

JOURNAL OF CHEMICAL PHYSICS | 1981年 / 74卷 / 02期

关键词：

D O I：

10.1063/1.441132

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

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页码：1453 / 1460

页数：8

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[9] ELECTRON-SPECTROSCOPY STUDY OF SILICON SURFACES EXPOSED TO XEF2 AND THE CHEMISORPTION OF SIF4 ON SILICON
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