ELECTRON-SPECTROSCOPY STUDY OF SILICON SURFACES EXPOSED TO XEF2 AND THE CHEMISORPTION OF SIF4 ON SILICON

被引：182

作者：

CHUANG, TJ

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1980年 / 51卷 / 05期

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D O I：

10.1063/1.327990

中图分类号：

O59 [应用物理学];

学科分类号：

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页码：2614 / 2619

页数：6

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