XPS AND AUGER INVESTIGATION OF CF3+ ION-BOMBARDMENT OF SILICON

[1] DETERMINATION OF RELATIVE ELECTRON INELASTIC MEAN FREE PATHS (ESCAPE DEPTHS) AND PHOTOIONISATION CROSS-SECTIONS BY X-RAY PHOTOELECTRON-SPECTROSCOPY [J]. JOURNAL OF THE CHEMICAL SOCIETY-FARADAY TRANSACTIONS II, 1975, 71 : 1777 - 1784

[2] INTERPRETATION OF X-RAY PHOTOEMISSION SPECTRA OF COBALT OXIDES AND COBALT OXIDE SURFACES [J]. SURFACE SCIENCE, 1976, 59 (02) : 413 - 429

[3] APPLICATIONS OF ESCA TO POLYMER CHEMISTRY .12. STRUCTURE AND BONDING IN COMMERCIALLY PRODUCED FLUOROGRAPHITES [J]. JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY, 1976, 14 (12) : 2941 - 2967

[4] ION-SURFACE INTERACTIONS IN PLASMA ETCHING [J]. JOURNAL OF APPLIED PHYSICS, 1977, 48 (08) : 3532 - 3540

[5] ELECTRON MEAN ESCAPE DEPTHS FROM X-RAY PHOTOELECTRON-SPECTRA OF THERMALLY OXIDIZED SILICON DIOXIDE FILMS ON SILICON [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (01): : 305 - 308

[6] Gelius U., 1970, Physica Scripta, V2, DOI 10.1088/0031-8949/2/1-2/014

[7] IDENTIFICATION OF FORM OF CARBON AT A SI(100) SURFACE USING AUGER ELECTRON SPECTROSCOPY [J]. PHYSICS LETTERS A, 1970, A 33 (06) : 386 - &

[8] AUGER ELECTRON SPECTROSCOPY OF SI [J]. SURFACE SCIENCE, 1970, 23 (02) : 347 - &

[9] ESCA STUDY OF ORGANOSILICON COMPOUNDS [J]. JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1976, 8 (05) : 343 - 357

[10] ION-INDUCED MIGRATION OF CU INTO SI [J]. JOURNAL OF APPLIED PHYSICS, 1975, 46 (05) : 1947 - 1951

[1] DETERMINATION OF RELATIVE ELECTRON INELASTIC MEAN FREE PATHS (ESCAPE DEPTHS) AND PHOTOIONISATION CROSS-SECTIONS BY X-RAY PHOTOELECTRON-SPECTROSCOPY [J]. JOURNAL OF THE CHEMICAL SOCIETY-FARADAY TRANSACTIONS II, 1975, 71 : 1777 - 1784

[2] INTERPRETATION OF X-RAY PHOTOEMISSION SPECTRA OF COBALT OXIDES AND COBALT OXIDE SURFACES [J]. SURFACE SCIENCE, 1976, 59 (02) : 413 - 429

[3] APPLICATIONS OF ESCA TO POLYMER CHEMISTRY .12. STRUCTURE AND BONDING IN COMMERCIALLY PRODUCED FLUOROGRAPHITES [J]. JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY, 1976, 14 (12) : 2941 - 2967

[4] ION-SURFACE INTERACTIONS IN PLASMA ETCHING [J]. JOURNAL OF APPLIED PHYSICS, 1977, 48 (08) : 3532 - 3540

[5] ELECTRON MEAN ESCAPE DEPTHS FROM X-RAY PHOTOELECTRON-SPECTRA OF THERMALLY OXIDIZED SILICON DIOXIDE FILMS ON SILICON [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (01): : 305 - 308

[6] Gelius U., 1970, Physica Scripta, V2, DOI 10.1088/0031-8949/2/1-2/014

[7] IDENTIFICATION OF FORM OF CARBON AT A SI(100) SURFACE USING AUGER ELECTRON SPECTROSCOPY [J]. PHYSICS LETTERS A, 1970, A 33 (06) : 386 - &

[8] AUGER ELECTRON SPECTROSCOPY OF SI [J]. SURFACE SCIENCE, 1970, 23 (02) : 347 - &

[9] ESCA STUDY OF ORGANOSILICON COMPOUNDS [J]. JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1976, 8 (05) : 343 - 357

[10] ION-INDUCED MIGRATION OF CU INTO SI [J]. JOURNAL OF APPLIED PHYSICS, 1975, 46 (05) : 1947 - 1951