INFRARED-LASER RADIATION EFFECTS ON XEF2 INTERACTION WITH SILICON

被引：48

作者：

CHUANG, TJ

机构：

来源：

JOURNAL OF CHEMICAL PHYSICS | 1981年 / 74卷 / 02期

关键词：

D O I：

10.1063/1.441159

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

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页码：1461 / 1466

页数：6

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