DIFFUSION OF IMPLANTED IMPURITIES IN AMORPHOUS SI

被引：52

作者：

POATE, JM

JACOBSON, DC

WILLIAMS, JS

ELLIMAN, RG

BOERMA, DO

机构：

[1] ROYAL MELBOURNE INST TECHNOL, MELBOURNE, VIC 3001, AUSTRALIA

[2] CSIRO, MELBOURNE, VIC 3001, AUSTRALIA

[3] STATE UNIV GRONINGEN, 9700 AB GRONINGEN, NETHERLANDS

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1987年 / 19-20卷

关键词：

D O I：

10.1016/S0168-583X(87)80095-2

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：480 / 483

页数：4

共 16 条

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GIBSON, JM ;

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POATE, JM ;

WILLIAMS, JS .

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[6]

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[8]

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[9] INTERDIFFUSION IN SI/GE AMORPHOUS MULTILAYER FILMS [J].

PROKES, SM ;

SPAEPEN, F .

APPLIED PHYSICS LETTERS, 1985, 47 (03) :234-236

[10]

REINELT M, 1981, J PHYSIQUE, P843

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