UNIVERSAL FINITE-SIZE EFFECTS IN THE RATE OF GROWTH-PROCESSES
被引:93
作者:
KRUG, J
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机构:UNIV MUNICH,W-8000 MUNICH 2,GERMANY
KRUG, J
MEAKIN, P
论文数: 0引用数: 0
h-index: 0
机构:UNIV MUNICH,W-8000 MUNICH 2,GERMANY
MEAKIN, P
机构:
[1] UNIV MUNICH,W-8000 MUNICH 2,GERMANY
[2] DUPONT CO,DEPT CENT RES & DEV,EXPT STN E356-153,WILMINGTON,DE 19880
来源:
JOURNAL OF PHYSICS A-MATHEMATICAL AND GENERAL
|
1990年
/
23卷
/
18期
关键词:
D O I:
10.1088/0305-4470/23/18/009
中图分类号:
O4 [物理学];
学科分类号:
0702 ;
摘要:
Kinetic roughening of the growing surface generates universal finite-size corrections in the growth rate of films and crystals. For thin films the correction scales with the film thickness h as h - alpha perpendicular to; for thick films it scales with the substrate size L as L- alpha//, where a/sub ///=2(1- zeta ) and alpha perpendicular to=2(1- zeta )/z in terms of the kinetic roughening exponents zeta and z. For ballistic deposits this implies a similar correction in the density. The coefficient of the correction is proportional to the KPZ coupling constant lambda . For one-dimensional substrates alpha /sub ///=1 and alpha perpendicular to=2/3. These predictions are corroborated by computer simulations of growth and deposition on one- and two-dimensional substrates, and by exact results for one-dimensional models. Different exponents apply in the weak results for one-dimensional models. Different exponents apply in the weak coupling regime and at kinetic roughening transitions.