PHOTOTHERMAL MEASUREMENTS ON OPTICAL THIN-FILMS

被引：91

作者：

WELSCH, E ^{[1
]}

RISTAU, D ^{[1
]}

机构：

[1] LASER ZENTRUM HANNOVER EV, LASERKOMPONENTEN, D-30419 HANNOVER, GERMANY

来源：

APPLIED OPTICS | 1995年 / 34卷 / 31期

关键词：

OPTICAL THIN FILMS; INTERFACE ABSORPTION; BULK ABSORPTION; SURFACE ABSORPTION; OPTICAL; THERMAL; AND ELASTIC THIN-FILM PROPERTIES; LASER RADIATION RESISTIVITY; PHOTOTHERMAL TECHNIQUE;

D O I：

10.1364/AO.34.007239

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

An overview of the application of the photothermal technique for optical as well as thermophysical characterizations of thin films is given. The peculiarities of this technique are discussed in some detail, and selected important results are pointed out. Emphasis is placed on the influence of both residual absorption and randomly distributed inhomogeneities in thin films on their laser-damage resistance.

引用

页码：7239 / 7253

页数：15

共 164 条

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