METALORGANIC CVD GROWTH OF GAAS-GAAIAS DOUBLE HETEROJUNCTION LASERS HAVING LOW INTERFACIAL RECOMBINATION AND LOW THRESHOLD CURRENT

被引:23
作者
THRUSH, EJ
SELWAY, PR
HENSHALL, GD
机构
[1] Standard Telecommunication Laboratories Limited, Harlow, Essex CM 17 9 NA, London Road
关键词
Aluminium compounds; Chemical vapour deposition; Gallium arsenide; Gallium compounds; Semiconductor junction lasers;
D O I
10.1049/el:19790111
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Double heterostructure laser junctions have been prepared by the metalorganic vapour deposition process and evaluated for threshold current and for nonradiative recombination characteristics. Threshold currents around 850 Acm2 were obtained, and measurements of carrier lifetime and spontaneous emission efficiency correlate well with a nonradiative lifetime of 20 ns. This value is similar to those obtained in junctions grown by liquid-phase epitaxy and puts an upper limit on interface recombination velocity of 500 cms−1. © 1979, The Institution of Electrical Engineers. All rights reserved.
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页码:156 / 158
页数:3
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