A PHOTOELECTRON-SPECTROSCOPY AND PHOTON STIMULATED DESORPTION STUDY OF H2O ON SI(100)2X1

被引：62

作者：

LARSSON, CUS

FLODSTROM, AS

NYHOLM, R

INCOCCIA, L

SENF, F

机构：

[1] UNIV LUND,MAXLAB,S-22100 LUND,SWEDEN

[2] HASYLAB,D-2000 HAMBURG 52,FED REP GER

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1987年 / 5卷 / 06期

关键词：

D O I：

10.1116/1.574190

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

收藏

页码：3321 / 3324

页数：4

相关论文

共 18 条

[1] EVIDENCE OF SIO AT THE SI-OXIDE INTERFACE BY SURFACE SOFT-X-RAY ABSORPTION NEAR EDGE SPECTROSCOPY
BIANCONI, A
[J]. SURFACE SCIENCE, 1980, 99 (01) : 76 - 86
[2] HYDRIDE FORMATION ON THE SI(100)-H2O SURFACE
CHABAL, YJ
[J]. PHYSICAL REVIEW B, 1984, 29 (06): : 3677 - 3680
[3] EVIDENCE OF DISSOCIATION OF WATER ON THE SI(100)2X1 SURFACE
CHABAL, YJ
CHRISTMAN, SB
[J]. PHYSICAL REVIEW B, 1984, 29 (12): : 6974 - 6976
[4] IDENTIFICATION OF AN ADSORBED HYDROXYL SPECIES ON THE PT(111) SURFACE
FISHER, GB
SEXTON, BA
[J]. PHYSICAL REVIEW LETTERS, 1980, 44 (10) : 683 - 686
[5] LOCALIZED BOND MODEL FOR H2O CHEMISORPTION ON SILICON SURFACES
FUJIWARA, K
[J]. SURFACE SCIENCE, 1981, 108 (01) : 124 - 134
[6] GEOMETRY-DEPENDENT SI(2P) SURFACE CORE-LEVEL EXCITATIONS FOR SI(111) AND SI(100) SURFACES
HIMPSEL, FJ
HEIMANN, P
CHIANG, TC
EASTMAN, DE
[J]. PHYSICAL REVIEW LETTERS, 1980, 45 (13) : 1112 - 1115
[7] OXYGEN-CHEMISORPTION AND OXIDE FORMATION ON SI(111) AND SI(100) SURFACES
HOLLINGER, G
HIMPSEL, FJ
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (02): : 640 - 645
[8] MULTIPLE-BONDING CONFIGURATIONS FOR OXYGEN ON SILICON SURFACES
HOLLINGER, G
HIMPSEL, FJ
[J]. PHYSICAL REVIEW B, 1983, 28 (06) : 3651 - 3653
[9] DISSOCIATIVE CHEMISORPTION OF H2O ON SI(100) AND SI(111) - A VIBRATIONAL STUDY
IBACH, H
WAGNER, H
BRUCHMANN, D
[J]. SOLID STATE COMMUNICATIONS, 1982, 42 (06) : 457 - 459
[10] IGNATIEV A, 1979, J PHYS, P1109