WAVELENGTH DEPENDENCE OF LASER-ENHANCED OXIDATION OF SILICON

被引:46
作者
SCHAFER, SA
LYON, SA
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1982年 / 21卷 / 02期
关键词
D O I
10.1116/1.571669
中图分类号
O59 [应用物理学];
学科分类号
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页码:422 / 425
页数:4
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PHYSICAL REVIEW B, 1981, 23 (10) :5543-5550