NUCLEATION OF VOIDS AND THEIR GROWTH DURING ELECTROMIGRATION

被引：18

作者：

SUHL, H

TURNER, PA

机构：

[1] UNIV CALIF,SAN DIEGO,LA JOLLA,CA 92037

[2] BELL TEL LABS INC,MURRAY HILL,NJ 07974

来源：

JOURNAL OF APPLIED PHYSICS | 1973年 / 44卷 / 11期

关键词：

D O I：

10.1063/1.1662058

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：4891 / 4895

页数：5

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[3] TIME-DEPENDENT VOID NUCLEATION DURING ELECTROMIGRATION [J].

OHRING, M .

MATERIALS SCIENCE AND ENGINEERING, 1971, 7 (03) :158-&