EVALUATION OF BERYLLIUM FOILS FOR X-RAY-LITHOGRAPHY BEAMLINES

被引：3

作者：

WELLS, GM ^{[1
]}

BRODSKY, EL ^{[1
]}

CERRINA, F ^{[1
]}

WALDO, WG ^{[1
]}

机构：

[1] MOTOROLA INC, ADV PROD RES & DEV LAB, AUSTIN, TX 78721 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1993年 / 11卷 / 06期

关键词：

D O I：

10.1116/1.586885

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A commonly used exit window material for x-ray lithography beamlines is beryllium, which combines a high degree of transparency to x rays with photon energies greater than 1000 eV, with the material strength that allows the use of thin windows that can support atmospheric pressure. The mechanical and x-ray transmission properties of beryllium foils are dependent on the purity of the initial materials and the fabrication technique used in the foil formation. An evaluation of the strength and x-ray transmission of foils prepared by using different initial materials and different techniques is presented. Improvements in exposure uniformity that are obtained by scanning to average the x-ray transmission variations are discussed.

引用

页码：3008 / 3011

页数：4

共 8 条

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