Substrate rotation in PVD processes and effects on the performance of coated tools

被引：4

作者：

Ebersbach, G.

Fabian, D.

Jehn, H. A.

Rother, B.

机构：

[1] Forschungsinst Edelnetalle & Metallchem, D-73525 Schwabisch Gmund, Germany

[2] Inst Phys & Mech Technol, Chemnitz, Germany

来源：

SURFACE & COATINGS TECHNOLOGY | 1995年 / 74-75卷 / 1-3期

关键词：

physical vapour deposition; TiN; (Ti; Cr); N; substrate rotation; machining (turning) test;

D O I：

10.1016/0257-8972(95)08332-4

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

TiN and (Ti,Cr)N coatings were deposited on hard metal inserts in a semi-industrial deposition device equipped with two hollow cathode arc evaporators and a substrate holder system with two superimposed basic rotations. The growth conditions on the rotating substrate holder were modelled and the appearance of a beating frequency as well as its absence depending on the position on the substrate holder was shown. The cutting tool inserts were mounted at two positions determined in this way, and coated in one charge. The performance of the coatings was investigated by metal cutting (turning) experiments on 50CrV4 steel. The appearance of the beating frequency in the coating conditions dramatically improved the performance of the ( Ti,Cr) N coated samples. The effect is discussed in connection with the performance of TiN coatings deposited in the same deposition device.

引用

页码：654 / 657

页数：4