ON THE POSSIBILITY OF PHYSICAL VAPOR-DEPOSITION PROCESS DESIGN BY COORDINATED SUBSTRATE ROTATION MODES

A typical multisource physical vapour deposition arrangement equipped with a threefold substrate rotation facility is modelled in terms of normalized flux and growth conditions at the rotating substrate surface. It is demonstrated that the mutual relationship between the various rotation frequencies affects the superposition of the fluxes and growth conditions with characteristic oscillations. Several typical ratios of the rotations are combined with identical and opposite directions of rotation.