A NEW METHOD FOR HARD COATINGS - ABS (ARC BOND SPUTTERING)

被引:139
作者
MUNZ, WD
SCHULZE, D
HAUZER, FJM
机构
[1] Hauzer Techno Coating Europe B.V., 5900 AE Venlo, P-Box 226, NL
关键词
D O I
10.1016/0257-8972(92)90058-I
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Unbalanced magnetron sputtering has made remarkable progress in the field of hard coatings during the last few years. Various arrangements of magnet and cathode have been reported recently. The new ABS(TM) physical vapour deposition coater HTC 1000-4 combines the methods of steered arc and unbalanced magnetron technology. It also uses an optimized four-cathode set-up with a combination of permanent magnets and electromagnets. This approach allows high ionization throughout the vacuum chamber and uses high productivity substrate fixtures which up till now have been used only in ion-plating systems with evaporation sources. The average bias current density in the new coater is approximately 4 mA cm-2 if operated under standard deposition parameters for TiN.
引用
收藏
页码:169 / 178
页数:10
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