DEPOSITION OF GRADED ALLOY NITRIDE FILMS BY CLOSED FIELD UNBALANCED MAGNETRON SPUTTERING

被引：88

作者：

MONAGHAN, DP

TEER, DG

LAING, KC

EFEOGLU, I

ARNELL, RD

机构：

[1] TEER COATINGS LTD,KIDDERMINSTER DY10 4JB,ENGLAND

[2] UNIV SALFORD,DEPT AERONAUT & MECH ENGN,SALFORD M5 4WT,LANCS,ENGLAND

来源：

SURFACE & COATINGS TECHNOLOGY | 1993年 / 59卷 / 1-3期

关键词：

D O I：

10.1016/0257-8972(93)90049-T

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The development of a deposition system based on closed field unbalanced magnetron sputter ion plating (uniform deposition and plasma), has greatly increased the number of complex nitrides that it is possible to routinely deposit. The new alloy nitrides can increase the hardness of standard TiN by a factor of 2, and can consequently result in longer tool life, In order to maintain high levels of coating to substrate adhesion, it is necessary to gradually grade the composition of the film in the interface region. Grading of an alloy nitride such as TiZrN will ensure minimum L(c) scratch adhesion levels of 75 N. The technique can be closely controlled and is very flexible, enabling the changes in composition to be attained with precision.

引用

页码：21 / 25

页数：5

共 14 条

[1]

EFEOGLU I, 1992, ICMCTF92 SAN DIEGO

[2]

MONAGHAN DP, 1992, 3RD P INT C SURF ENG

[3]

MUNZ WD, 1989, WEAR CORROSION RESIS

[4] REACTIVE DEPOSITION OF HARD COATINGS [J].