A MAGNETRON SPUTTER ION PLATING SYSTEM

A new type of system for the deposition of hard coatings on cutting tools has been designed, constructed and tested. The system is based on the well-established principles of magnetron sputter source ion plating but uses a long narrow cylindrical chamber with three magnetrons running the full length of the chamber. This geometry is such that all samples are in the same coating and plasma environment, ensuring uniformity of thickness, adhesion, stoichiometry and structure of the coating over the surface of each sample and for all samples. It also results in a very efficient use of chamber volume, fast pumpdowns, fast deposition times and therefore high productivity.