PHYSICAL VAPOR-DEPOSITION OF THICK CR AND ITS CARBIDE AND NITRIDE FILMS BY HOLLOW-CATHODE DISCHARGE

被引：43

作者：

KOMIYA, S ^{[1
]}

TSURUOKA, K ^{[1
]}

机构：

[1] ULVAC CORP,2500 HAGISONO,CHIGASAKI 253,JAPAN

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1976年 / 13卷 / 01期

关键词：

D O I：

10.1116/1.568915

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：520 / 524

页数：5

共 10 条

[1] ACTIVATED REACTIVE EVAPORATION PROCESS FOR HIGH RATE DEPOSITION OF COMPOUNDS
BUNSHAH, RF
RAGHURAM, AC
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (06): : 1385 - &
[2] THERMAL INPUT TO SUBSTRATE DURING DEPOSITION BY HOLLOW-CATHODE DISCHARGE
KOMIYA, S
TSURUOKA, K
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (01): : 589 - 592
[3] KOMIYA S, 1974, JPN J APPL PHYS, P415
[4] LOEB LB, 1961, BASIC PROCESSES GASE, P205
[5] HIGH RATE ION PRODUCTION FOR VACUUM DEPOSITION
MORLEY, JR
SMITH, HR
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (06): : 1377 - &
[6] SYNTHESIS OF ALLOY CARBIDES BY ACTIVATED REACTIVE EVAPORATION PROCESS
NIMMAGADDA, R
BUNSHAH, RF
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (01): : 585 - 587
[7] EFFECT OF SUBSTRATE TEMPERATURE ON STRUCTURE OF TITANIUM CARBIDE DEPOSITED BY ACTIVATED REACTIVE EVAPORATION
RAGHURAM, AC
BUNSHAH, RF
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (06): : 1389 - &
[8] ION-PLATED TITANIUM CARBIDE COATINGS
STOWELL, WR
[J]. THIN SOLID FILMS, 1974, 22 (01) : 111 - 120
[9] WAN CT, 1971, J VAC SCI TECHNOL, V8, P99
[10] VACUUM COATING WITH A HOLLOW-CATHODE SOURCE
WILLIAMS, DG
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (01): : 374 - 376