EFFECT OF SUBSTRATE TEMPERATURE ON STRUCTURE OF TITANIUM CARBIDE DEPOSITED BY ACTIVATED REACTIVE EVAPORATION

被引：80

作者：

RAGHURAM, AC

BUNSHAH, RF

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1972年 / 9卷 / 06期

关键词：

D O I：

10.1116/1.1317046

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1389 / &

共 12 条

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BITTNER, H
GORETZKI, H
[J]. MONATSHEFTE FUR CHEMIE, 1962, 93 (05): : 1000 - +
[3] ACTIVATED REACTIVE EVAPORATION PROCESS FOR HIGH RATE DEPOSITION OF COMPOUNDS
BUNSHAH, RF
RAGHURAM, AC
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (06): : 1385 - &
[4] BUNSHAH RF, UNPUBLISHED DATA
[5] GILLMAN JJ, 1961, J APPL PHYS, V32, P1405
[6] GREELAND KH, 1961, BRIT J SCI INST, V38, P1
[7] Kennedy K., 1968, T INT VACUUM METALLU, P195
[8] KOSICKI BB, 1969, J VAC SCI TECHNOL, V6, P592
[9] The condensation and evaporation of gas molecule
Langmuir, I
[J]. PROCEEDINGS OF THE NATIONAL ACADEMY OF SCIENCES OF THE UNITED STATES OF AMERICA, 1917, 3 : 141 - 147
[10] Movchan B. A., 1969, Fizika Metallov i Metallovedenie, V28, P653