A HIGH-RATE SPUTTERING PROCESS FOR THE FORMATION OF HARD FRICTION-REDUCING TIN COATINGS ON TOOLS

[1] BARANY I, 1978, VAK TECH, V28, P168

[2] THE ACTIVATED REACTIVE EVAPORATION PROCESS - DEVELOPMENTS AND APPLICATIONS [J]. THIN SOLID FILMS, 1981, 80 (1-3) : 255 - 261

[3] DACHSELT WD, 1982, P SOC PHOTO-OPT INST, V324, P37, DOI 10.1117/12.933252

[4] HABIG KH, 1980, Z WERKSTOFFTECH, V11, P182

[5] HARTSOUGH LD, 1979, SOLID STATE TECH DEC, P66

[6] CHEMICAL VAPOR-DEPOSITION APPLIED IN TRIBOLOGY [J]. WEAR, 1978, 47 (02) : 407 - 415

[7] KIENEL G, 1981, VAKUUM-TECH, V30, P236

[8] FUNDAMENTALS OF ION PLATING [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1973, 10 (01): : 47 - 52

[9] MUNZ WD, 1981, VAKUUM-TECH, V30, P78

[10] MUNZ WD, 1981, IND RES DEV, V23, P130

[1] BARANY I, 1978, VAK TECH, V28, P168

[2] THE ACTIVATED REACTIVE EVAPORATION PROCESS - DEVELOPMENTS AND APPLICATIONS [J]. THIN SOLID FILMS, 1981, 80 (1-3) : 255 - 261

[3] DACHSELT WD, 1982, P SOC PHOTO-OPT INST, V324, P37, DOI 10.1117/12.933252

[4] HABIG KH, 1980, Z WERKSTOFFTECH, V11, P182

[5] HARTSOUGH LD, 1979, SOLID STATE TECH DEC, P66

[6] CHEMICAL VAPOR-DEPOSITION APPLIED IN TRIBOLOGY [J]. WEAR, 1978, 47 (02) : 407 - 415

[7] KIENEL G, 1981, VAKUUM-TECH, V30, P236

[8] FUNDAMENTALS OF ION PLATING [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1973, 10 (01): : 47 - 52

[9] MUNZ WD, 1981, VAKUUM-TECH, V30, P78

[10] MUNZ WD, 1981, IND RES DEV, V23, P130