FUNDAMENTALS OF ION PLATING

被引：190

作者：

MATTOX, DM ^{[1
]}

机构：

[1] SANDIA LABS,ALBUQUERQUE,NM 87115

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1973年 / 10卷 / 01期

关键词：

D O I：

10.1116/1.1318041

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

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页码：47 / 52

页数：6

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共 46 条

[1] ION-BEAM DEPOSITION OF THIN FILMS OF DIAMONDLIKE CARBON
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[J]. JOURNAL OF APPLIED PHYSICS, 1971, 42 (07) : 2953 - +
[2] BLAND RD, 1968, ELECTROCHEM TECHNOL, V6, P272
[3] ROLE OF ADHERENCE OXIDES IN DEVELOPMENT OF CHEMICAL BONDING AT GLASS-METAL INTERFACES
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[4] INFLUENCE OF ION-BOMBARDMENT ON MICROSTRUCTURE OF THICK DEPOSITS PRODUCED BY HIGH RATE PHYSICAL VAPOR-DEPOSITION PROCESSES
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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (06): : 1404 - &
[5] CHESTER AN, 1968, PHYS REV, V167, P172
[6] CULBERTON R, 1966, 8TH C TUB TECHN IEEE, P101
[7] CULBERTSON RD, 1971, Patent No. 3604970
[8] ION ENERGIES AT CATHODE OF A GLOW DISCHARGE
DAVIS, WD
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[J]. PHYSICAL REVIEW, 1963, 131 (01): : 219 - &
[9] ANALYSIS AND DESIGN OF ION-BEAM DEPOSITION APPARATUS
FAIR, RB
[J]. JOURNAL OF APPLIED PHYSICS, 1971, 42 (08) : 3176 - &
[10] PRODUCTION AND DEMONSTRATION OF ATOMICALLY CLEAN METAL SURFACES
HAGSTRUM, HD
DAMICO, C
[J]. JOURNAL OF APPLIED PHYSICS, 1960, 31 (04) : 715 - 723

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