FUNDAMENTALS OF ION PLATING

被引：190

作者：

MATTOX, DM ^{[1
]}

机构：

[1] SANDIA LABS,ALBUQUERQUE,NM 87115

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1973年 / 10卷 / 01期

关键词：

D O I：

10.1116/1.1318041

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：47 / 52

页数：6

共 46 条

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[43] AUGER-ELECTRON SPECTROSCOPY STUDIES OF SPUTTER DEPOSITION AND SPUTTER REMOVAL OF MO FROM VARIOUS METAL-SURFACES
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WEHNER, GK
[J]. JOURNAL OF APPLIED PHYSICS, 1972, 43 (05) : 2268 - &
[44] WAN CT, 1971, J VAC SCI TECHNOL, V8, P99
[45] LOW-PRESSURE SPUTTERED GERMANIUM FILMS
WOLSKY, SP
PIWKOWSK.TR
WALLIS, G
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1965, 2 (03): : 97 - &
[46] WOLTER AR, 1965, MICROELECTRON RELIAB, V4, P101