ACTIVATION OF REACTIVE SPUTTERING BY A PLASMA BEAM FROM AN UNBALANCED MAGNETRON

被引：31

作者：

SPENCER, AG ^{[1
]}

OKA, K ^{[1
]}

HOWSON, RP ^{[1
]}

LEWIN, RW ^{[1
]}

机构：

[1] INCO SELECT SURFACES LTD,BIRMINGHAM B16 0AJ,ENGLAND

来源：

关键词：

D O I：

10.1016/0042-207X(88)90479-4

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：857 / 859

页数：3

共 10 条

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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (01): : 147 - 151
[2] FRASER DB, 1978, THIN FILM PROCESSES, P125
[3] GREENE JE, 1987, SOLID STATE TECHNOL, V30, P115
[4] HOWSON RP, 1983, P SOC PHOTO-OPT INST, V428, P14, DOI 10.1117/12.936294
[5] ION-BASED METHODS FOR OPTICAL THIN-FILM DEPOSITION
MARTIN, PJ
[J]. JOURNAL OF MATERIALS SCIENCE, 1986, 21 (01) : 1 - 25
[6] Oka K., 1987, IPAT 87. 6th International Conference on Ion and Plasma Assisted Techniques, P158
[7] GAS-DENSITY REDUCTION EFFECTS IN MAGNETRONS
ROSSNAGEL, SM
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (01): : 19 - 24
[8] UNBALANCED MAGNETRON ION-ASSISTED DEPOSITION AND PROPERTY MODIFICATION OF THIN-FILMS
SAVVIDES, N
WINDOW, B
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (03): : 504 - 508
[9] PRESSURE STABILITY IN REACTIVE MAGNETRON SPUTTERING
SPENCER, AG
HOWSON, RP
LEWIN, RW
[J]. THIN SOLID FILMS, 1988, 158 (01) : 141 - 149
[10] CHARGED-PARTICLE FLUXES FROM PLANAR MAGNETRON SPUTTERING SOURCES
WINDOW, B
SAVVIDES, N
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (02): : 196 - 202