CHARGED-PARTICLE FLUXES FROM PLANAR MAGNETRON SPUTTERING SOURCES

[1] Bohm D., 1949, CHARACTERISTICS ELEC, P13

[2] CHAPIN JS, 1974, RES DEV, V25, P37

[3] Chapman B., 1980, GLOW DISCHARGE PROCE

[4] CHEN F, 1974, INTRO PLASMA PHYSICS

[5] FILM DEPOSITION WITH SPUTTER GUN [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (01): : 147 - 151

[6] EPITAXIAL CRYSTAL-GROWTH BY SPUTTER DEPOSITION - APPLICATIONS TO SEMICONDUCTORS .1. [J]. CRC CRITICAL REVIEWS IN SOLID STATE AND MATERIALS SCIENCES, 1983, 11 (01): : 47 - 97

[7] SUBSTRATE FLOATING POTENTIAL CHARACTERISTICS IN PLANAR MAGNETRON AND HT SPUTTERING SYSTEMS [J]. VACUUM, 1980, 30 (07) : 267 - 274

[8] Krall N. A, 1973, PRINCIPLES PLASMA PH

[9] EFFECT OF ION-BOMBARDMENT ON INITIAL-STAGES OF THIN-FILM GROWTH [J]. THIN SOLID FILMS, 1977, 46 (03) : 267 - 274

[10] ION-BEAM-ASSISTED DEPOSITION OF THIN-FILMS [J]. APPLIED OPTICS, 1983, 22 (01): : 178 - 184

[1] Bohm D., 1949, CHARACTERISTICS ELEC, P13

[2] CHAPIN JS, 1974, RES DEV, V25, P37

[3] Chapman B., 1980, GLOW DISCHARGE PROCE

[4] CHEN F, 1974, INTRO PLASMA PHYSICS

[5] FILM DEPOSITION WITH SPUTTER GUN [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (01): : 147 - 151

[6] EPITAXIAL CRYSTAL-GROWTH BY SPUTTER DEPOSITION - APPLICATIONS TO SEMICONDUCTORS .1. [J]. CRC CRITICAL REVIEWS IN SOLID STATE AND MATERIALS SCIENCES, 1983, 11 (01): : 47 - 97

[7] SUBSTRATE FLOATING POTENTIAL CHARACTERISTICS IN PLANAR MAGNETRON AND HT SPUTTERING SYSTEMS [J]. VACUUM, 1980, 30 (07) : 267 - 274

[8] Krall N. A, 1973, PRINCIPLES PLASMA PH

[9] EFFECT OF ION-BOMBARDMENT ON INITIAL-STAGES OF THIN-FILM GROWTH [J]. THIN SOLID FILMS, 1977, 46 (03) : 267 - 274

[10] ION-BEAM-ASSISTED DEPOSITION OF THIN-FILMS [J]. APPLIED OPTICS, 1983, 22 (01): : 178 - 184