SUBSTRATE FLOATING POTENTIAL CHARACTERISTICS IN PLANAR MAGNETRON AND HT SPUTTERING SYSTEMS

被引：16

作者：

HOLLAND, L

SAMUEL, G

机构：

来源：

关键词：

D O I：

10.1016/S0042-207X(80)80038-8

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：267 / 274

页数：8

共 8 条

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CUOMO, JJ ;

GAMBINO, RJ ;

KAUFMAN, HR ;

ROBINSON, RS .

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HOLLAND, L .

HOLLAND, L ;

PRIESTLAND, CR .

[5]

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[6]

KNAUER W, 1963, 10TH T NATL VAC S BO, P180

[7]

Knauer W., 1965, U.S. patent, Patent No. [3,216,652, 3216652]

[8]

VOSSEN JL, 1978, THIN FILM PROCESSES, P55