EFFECT OF SECONDARY ELECTRONS AND NEGATIVE-IONS ON SPUTTERING OF FILMS

被引：47

作者：

HANAK, JJ ^{[1
]}

PELLICANE, JP ^{[1
]}

机构：

[1] RCA LABS,PRINCETON,NJ 08540

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1976年 / 13卷 / 01期

关键词：

D O I：

10.1116/1.568931

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：406 / 409

页数：4

共 15 条

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[8] MULTIPLE-SAMPLE-CONCEPT IN MATERIALS RESEARCH - SYNTHESIS, COMPOSITIONAL ANALYSIS AND TESTING OF ENTIRE MULTICOMPONENT SYSTEMS [J].

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[9] CALCULATION OF DEPOSITION PROFILES AND COMPOSITIONAL ANALYSIS OF COSPUTTERED FILMS [J].

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[10]

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