ION-BEAM-ASSISTED DEPOSITION OF THIN-FILMS

被引:235
作者
MARTIN, PJ
MACLEOD, HA
NETTERFIELD, RP
PACEY, CG
SAINTY, WG
机构
来源
APPLIED OPTICS | 1983年 / 22卷 / 01期
关键词
D O I
10.1364/AO.22.000178
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
引用
收藏
页码:178 / 184
页数:7
相关论文
共 26 条
[1]   PHYSICS OF ION PLATING AND ION-BEAM DEPOSITION [J].
AISENBERG, S ;
CHABOT, RW .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1973, 10 (01) :104-107
[2]  
ALLEN TH, 1982, P SOC PHOTO-OPT INST, V325, P93, DOI 10.1117/12.933291
[3]   ION-INDUCED PHYSICAL AND OPTICAL DENSIFICATION IN OBLIQUELY DEPOSITED SE0.75GE0.25 FILMS [J].
CHOPRA, KL ;
HARSHAVARDHAN, KS ;
RAJAGOPALAN, S ;
MALHOTRA, LK .
APPLIED PHYSICS LETTERS, 1982, 40 (05) :428-430
[4]  
EBERT J, 1982, P SOC PHOTO OPT INST, V325
[5]   SOME TRENDS IN PREPARING FILM STRUCTURES BY ION-BEAM METHODS [J].
GAUTHERIN, G ;
WEISSMANTEL, C .
THIN SOLID FILMS, 1978, 50 (MAY) :135-144
[6]   AUGER AND X-RAY PHOTOELECTRON-SPECTROSCOPY STUDIES OF PREFERENTIAL SPUTTERING IN Y2O3-DOPED ZRO2 FILMS [J].
GREENE, JE ;
KLINGER, RE ;
BARR, TL ;
WELSH, LB .
CHEMICAL PHYSICS LETTERS, 1979, 62 (01) :46-50
[7]  
GUENTHER KH, 1976, APPL OPTICS, V15, P2992, DOI 10.1364/AO.15.002992
[8]  
HIRAGA R, 1974, J APPL PHYS 7 S, V2, P689
[9]   THIN-FILM ANNEALING BY ION-BOMBARDMENT [J].
HIRSCH, EH ;
VARGA, IK .
THIN SOLID FILMS, 1980, 69 (01) :99-105
[10]   EFFECT OF ION-BOMBARDMENT ON INITIAL-STAGES OF THIN-FILM GROWTH [J].
MARINOV, M .
THIN SOLID FILMS, 1977, 46 (03) :267-274